MV1000工業(yè)顯微鏡廣泛應用于半導體,電子工業(yè)進行晶體,集成電路的檢驗和科學研究.
配備有反射照明,成象和觀察系統(tǒng),偏光裝置.
Industrialmicroscopeiswidelyusedforcrystal,integratedcircuit(IC)examinationandresearch.Itissuppliedwithreflectedillumination,imagingandviewingsystem,polarizedimagingsystem.
MV1000大景深金相顯微鏡規(guī)格Specifications
1、◇無限遠光學系統(tǒng),管鏡焦距200mm
InfinitiveOpticalSystem,TubeLensFocalLength200mm
2、◇鉸鏈式三目鏡筒,30°傾斜,瞳距55-75mm
CompensationFreeTrinocularTube,Inclinedat30°,InterpupillaryDistance55-75mm
3、◇高眼點,大視場目鏡WF10X/22
HighPointandWideFieldEyepieceWF10/22
4、◇長工作距離,平場復消色差物鏡2X/0.055,5X/0.14,10X/0.28,20X/0.29,50X/0.42
LongWorkingDistance,PlanApoObjectives2X/0.055,5X/0.14,10X/0.28,20X/0.29,50X/0.42
5、◇五孔物鏡轉(zhuǎn)換器
QuintupleNosepiece
6.◇6″雙層活動平臺和圓平臺
6″DoubleLayersMechanicalStageandcirclestage
7、同軸粗微調(diào)焦機構(gòu),微動格值0.002mm
CoaxialCoarse&FinFocusAdjustmentSystem,FineDivision0.002mm
8、◇照明系統(tǒng)Illuminattem12V50W鹵素燈照明
9、圖像采集裝置CV320
10、顯微圖像分析軟件ImageAnalysisSystem11.0。
